Plat, Marina: search on Z-Library

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1

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Characterization of photo-acid redeposition in 193-nm photoresists

Wallow, Thomas, Lin, Qinghuang, Plat, Marina, Zhang, Zhanping, MacDonald, Brian, Bernard, Joffre, Romero, Jeremias, La Fontaine, Bruno, Levinson, Harry J.

Year:

2007

Language:

english

File:

PDF, 910 KB

english, 2007

2

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Integration of optical proximity correction strategies in strong phase-shifter design for polygate layers

Spence, Chris A., Plat, Marina V., Sahouria, Emile Y., Cobb, Nicolas B., Schellenberg, Franklin M., Morimoto, Hiroaki

Year:

2000

Language:

english

File:

PDF, 3.40 MB

english, 2000

3

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Novel DNQ PACs for high-resolution i-line lithography

Brunsvold, William R., Eib, Nicholas K., Lyons, Christopher F., Miura, Steve S., Plat, Marina V., Dammel, Ralph R., Evans, O. B., Rahman, M. D., Khanna, Dinesh N., Jain, Sangya, Lu, Ping-Hung, Ficner,

Year:

1992

Language:

english

File:

PDF, 974 KB

english, 1992

4

[IEEE 2006 7th Annual Non-Volatile Memory Technology Symposium - San Mateo, CA, USA (2006.11.5-2006.11.8)] 2006 7th Annual Non-Volatile Memory Technology Symposium - Eliminating Word Line Bending In Floating Gate NOR Flash Memory To Reduce Array Size and Improve Manufacturability

Fang, Shenqing, Chang, Kuo-Tung, Lee, Sung-Chul, Reiss, Joerg, Takahashi, Makoto, Plat, Marina, Ho, Siu, Rangarajan, Arjun, Leung, Wing, Kwan, Ming, Park, Sheung-Hee, Ko, Kelwin, Joshi, Amol, Kinoshit

Year:

2006

Language:

english

File:

PDF, 4.86 MB

english, 2006

5

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Resolution capability and the mask error enhancement function (MEEF) for ArF and KrF lithography

Plat, Marina V., Spence, Chris A., Lyons, Christopher F., Wilkison, Amada, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 238 KB

english, 2001

6

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Optical/Laser Microlithography - TAR processing for CD control in I-line and 248-nm lithography

Lyons, Christopher F., Eib, Nicholas K., Plat, Marina V., Spinillo, Gary T., Welsh, Kevin M., Cuthbert, John D.

Year:

1993

Language:

english

File:

PDF, 418 KB

english, 1993

7

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Impact of optical enhancement techniques on the mask error enhancement function (MEEF)

Plat, Marina V., Nguyen, Khanh B., Spence, Chris A., Lyons, Christopher F., Wilkison, Amada, Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 315 KB

english, 2000

8

Application of ion chromatography to failure analysis of electronics packaging

Marina Plat, Judy de Leo

Journal:

Journal of Chromatography A

Year:

1991

Language:

english

File:

PDF, 250 KB

english, 1991

9

Urinary aquaporin-2 excretion during ibuprofen or indomethacin treatment in preterm infants with patent ductus arteriosus

Yanhong Li, Marina Zelenina, Geneviève Plat-Willson, Marie-Odile Marcoux, Anita Aperia, Charlotte Casper

Journal:

Acta Paediatrica

Year:

2011

Language:

english

File:

PDF, 293 KB

english, 2011

10

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers

Spence, Chris A., Plat, Marina V., Sahouria, Emile Y., Cobb, Nicolas B., Schellenberg, Franklin M., Abboud, Frank E., Grenon, Brian J.

Year:

1999

Language:

english

File:

PDF, 1.64 MB

english, 1999

11

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Shot-size reduction of photoresist formulations

Moreau, Wayne M., Cornett, Kathleen M., Fahey, James T., Linehan, Leo L., Montgomery, Warren, Plat, Marina V., Smith, Randolph S., Wood, Robert L., Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 324 KB

english, 1995

12

X-Ray Diffraction of Basic Types of Geological Minerals Layered and Framework Silicates Edited by V. A. Frank-Kamenetsky, NEDRA Publishers, Leningrad, USSR, 1983 (In Russian)

Plat, Marina V.

Journal:

Powder Diffraction

Year:

1987

Language:

english

File:

PDF, 106 KB

english, 1987

13

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation

Plat, Marina V., Brunsvold, William R., Smith, Randolph S., Eib, Nicholas K., Lyons, Christopher F., Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 686 KB

english, 1995

14

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Manufacturability of the ultrathin resist process

Pike, Christopher, Bell, Scott, Plat, Marina V., King, Paul, Nguyen, Khanh B., Lyons, Christopher F., Levinson, Harry J., Phan, Khoi A., Okoroanyanwu, Uzodinma, Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 2.42 MB

english, 2000

15

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - ArF lithography: challenges, resolution capability, and the mask error enhancement function (MEEF)

Plat, Marina V., Lyons, Christopher F., Wilkison, Amada, Schefske, Jeff A., Kim, Hung-Eil, Mack, Chris A., Stevenson, Tom

Year:

2001

Language:

english

File:

PDF, 339 KB

english, 2001

16

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Design restrictions for patterning with off-axis illumination

Matthew, Itty, Smith, Bruce W., Tabery, Cyrus E., Lukanc, Todd, Plat, Marina, Takahashi, Makoto, Wilkison, Amada

Year:

2005

Language:

english

File:

PDF, 1.01 MB

english, 2005

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